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Hi Shahin,
Would this work to remove any peel and moves between layers? Basically do a dual exposure on each layer? Only on Odd.
M650 D{([[LayerNumber]]=ODD)*2+3} S{4-(([[LayerNumber]]<30)*3)}
M651
G4 P1000
G1 Z[[LayerPosition]]
[[WaitForDoneMessage]]
[[PositionSet [[LayerPosition]]]]
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M650 D{([[LayerNumber]]%2==1)*2+3} S{4-(([[LayerNumber]]<30)*3)}
M651
G4 P1000
G1 Z[[LayerPosition]]
[[WaitForDoneMessage]]
[[PositionSet [[LayerPosition]]]]
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Thanks Shahin!
If I want to add 30 microns to eliminate hysterisis from motion (it's the same in up or down z)
M650 D{([[LayerNumber]]<30)*2+3} S{4-(([[LayerNumber]]<30)*3)}
M651
G4 P1000
G1 Z0.03
G1 Z[[LayerPosition]]
[[WaitForDoneMessage]]
[[PositionSet [[LayerPosition]]]]
Just in the before each layer correct?
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And if I want to remove peel completely just take out the M650 (configure peel) and M651 (call peel move) correct? New segment would read:
G1 Z2.0 S{4-(([[LayerNumber]]<30)*3)}; level lift with dynamic speed
G4 P1000; if needed pause at top of lift (will this over-ride the wait on lift - is it still required? The peel command was removed)
G1 Z-2.0; move back to original position
G1 Z0.03; remove up hysteresis
G1 Z[[LayerPosition]]; move to next layer position
[[WaitForDoneMessage]]
[[PositionSet [[LayerPosition]]]]
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